Ion Beam Lithography I.
Place
Location: Trieste - Italy
Date:
17 Aug 11:00 - 12:30
Description
The basic concepts on the employment of keV and MeV ions for the micro- and nano-fabrication of advanced materials will be introduced, with comparisons with standard lithographic techniques. The current state of the art on most significant applications of ion beam lithography in materials of widespread use (such as silicon and photo-resists) will be reviewed.
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Organizers
IAEA: Aliz Simon and Andrej Zeman; Local Organiser: Sandro Scandolo