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Ion Beam Lithography I.

Place

Location: Trieste - Italy
Date: 17 Aug 11:00 - 12:30

Description

The basic concepts on the employment of keV and MeV ions for the micro- and nano-fabrication of advanced materials will be introduced, with comparisons with standard lithographic techniques. The current state of the art on most significant applications of ion beam lithography in materials of widespread use (such as silicon and photo-resists) will be reviewed.

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Presented by PAOLO OLIVERO on 17/8/2012 at 11:00
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Organizers

IAEA: Aliz Simon and Andrej Zeman; Local Organiser: Sandro Scandolo