INTRALAYER DIFFUSION PROCESSES RELEVANT TO THE GROWTH OF FCC(110) METAL SURFACES
Starts 28 Jul 2004 11:00
Ends 28 Jul 2004 20:00
Central European Time
ICTP
Main Building Seminar Room
Strada Costiera, 11
I - 34151 Trieste (Italy)
Abstract: We use molecular dynamics simulation to produce a map of the
adatom migration barriers on fcc(110) metal surfaces. The metals have been
modeled by many-body potentials within the second moment approximation to
the tight-binding model. The estimated barriers are found to be influenced
by the proximity of steps and terrace size. For each metal, the onset
temperatures of some important diffusion processes are estimated through a
1-d exactly solvable growth model constructed to describe the growth along
the [001] and the [1$\\overline{1}$0] directions separately.